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Atomistics simulations of structures and properties of 1/2 <110> dislocations using three different embedded-atom method potentials fit to gamma-TiAl

机译:使用适合于γ-TiAl的三种不同的嵌入原子方法势,对1/2 <110>位错的结构和性质进行原子模拟

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Molecular statics simulations were made of dislocations in L1(0) structures, using three different embedded-atom method (EAM) potentials that were fitted to the bulk properties of gamma-TiAl. The three EAM potentials were fitted to produce complex stacking-fault energies of 120, 320 and 580 mJ m(-2) so that the effects of variations in fault energies could be investigated parametrically. Core structures were determined for each of the potentials for the following orientations: screw, 30 degrees mixed, 60 degrees mixed and edge. These cores were all planar except the screw orientations calculated with the 320 and 580 mJ m(-2) potentials. These showed substantial amounts of non-planar spreading. The 60 degrees orientations for these two potentials had a tendency for the screw component of the displacement to spread out of plane and the edge component to spread in the glide plane. The screw orientation of the 320 mJ m(-2) potential was found to have two possible states: planar and non-planar. The friction stresses were determined for all orientations of the 320 mJ m(-2) potential, since this appeared to represent gamma-TiAl most closely. The friction stresses for the other potentials were determined only for the orientations producing the highest friction stress for the 320 mJ m(-2) potential. It was also found that the close-packed directions, screw and 60 degrees, had the highest friction stress and the more sparsely packed directions having a considerably lower value. The friction stress for the 320 mJ m(-2) potential was found to be 250 MPa, in good agreement with published experimental values of critical resolved shear stress for gamma-TiAl. Comparing line orientations with the same atomic directions, the effects of ordering on the friction stress predicted by Greenberg et al (1991, Acta metall. mater., 39, 233) in 1991 were observed. These variations had a considerably smaller effect than did the atomic density along the line orientation.
机译:使用适合于γ-TiAl整体性质的三种不同的嵌入原子方法(EAM)电势,对L1(0)结构中的位错进行了分子静态模拟。拟合了三个EAM电位,以产生120、320和580 mJ m(-2)的复杂堆叠故障能量,因此可以通过参数研究故障能量变化的影响。针对以下取向的每种电势,确定芯结构:螺旋,30度混合,60度混合和边缘。除了使用320和580 mJ m(-2)电位计算出的螺钉方向外,这些磁芯都是平面的。这些显示出大量的非平面扩散。这两个电位的60度方向趋向于使位移的螺钉分量散布到平面外,而边缘分量散布在滑行平面上。发现320 mJ m(-2)电位的螺钉方向具有两个可能的状态:平面和非平面。确定了320 mJ m(-2)电位的所有方向的摩擦应力,因为这似乎最紧密地代表了γ-TiAl。仅针对在320 mJ m(-2)电位下产生最高摩擦应力的方向确定了其他电位的摩擦应力。还发现,密堆积方向(螺线和60度)具有最高的摩擦应力,而较稀疏的堆积方向的值要低得多。发现320 mJ m(-2)电位的摩擦应力为250 MPa,与已发表的针对γ-TiAl的临界解析剪切应力的实验值高度吻合。将线取向与相同的原子方向进行比较,观察到有序化对格林伯格等人(1991,金属学报,1991,39,233)预测的摩擦应力的影响。这些变化的影响远小于沿线方向的原子密度。

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