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Accumulation of geometrically necessary dislocations near grain boundaries in deformed copper

机译:变形铜在晶界附近的几何必要位错的积累

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Cross-correlation-based analysis of electron backscatter diffraction patterns has been used to map the distribution of geometrically necessary dislocation (GND) density in deformed polycrystalline copper. Patterning of the dislocations into high-density cell walls and low-density cell interiors was readily observed at the micron scale. Patterning at the longer length scale of the grain size was also evident with high-density regions (GND hot spots) tending to be in clusters, often found close to some but not all grain boundaries and triple junctions.
机译:电子背散射衍射图的基于互相关的分析已用于绘制变形多晶铜中几何必要位错(GND)密度的分布图。在微米级很容易观察到位错进入高密度细胞壁和低密度细胞内部的图案。高密度区域(GND热点)往往呈簇状,在晶粒的较长长度尺度上也很明显,通常在一些但不是全部晶界和三重结附近发现。

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