STRUCTURE AND PHOTOCATALYTIC PROPERTIES OF N-DOPED TiO_(2_x) FILMS PREPARED BY N-ION IMPLANTATION

摘要

Nitrogen doped TiO_(2-x) films have been prepared by using N-ion implantation method. X-ray diffraction patterns of the N-doped TiO_(2-x) films could be indexed with rutile TiO_2 and Ti_7O_(13) in structure. XPS measurements revealed a 2.73 atm.% concentration of N atoms in the N-doped films and two N 1s photoelectron binding energies at 396.3 and 3999.9 eV originating from N-doped TiO_2 and N-doped Ti_7O_(13), respectively, The photocatalytic properties of the N-doped films under visible light have been investigated by degradation of methylene blue solution.