...
首页> 外文期刊>Superconductor Science & Technology >Critical current density distribution in the superconducting oxide layer of pre-annealing and intermediate-rolling processed Bi2Sr2CaCu2Ox/Ag composite tapes
【24h】

Critical current density distribution in the superconducting oxide layer of pre-annealing and intermediate-rolling processed Bi2Sr2CaCu2Ox/Ag composite tapes

机译:预退火和中轧Bi2Sr2CaCu2Ox / Ag复合带的超导氧化物层中的临界电流密度分布

获取原文
获取原文并翻译 | 示例
           

摘要

The critical current density (J(c)) distribution in the oxide layer of PAIR (pre-annealing and intermediate rolling) processed Bi2Sr2CaCu2Ox (Bi-2212)/Ag composite tapes is studied in order to give a clear explanation for the large J(c) enhancement by the PAIR process. J(c) of the oxide layer within 2 mu m from the Bi-2212/Ag interface exceeds 3.8 x 10(5) A cm(-2) at 4.2 K and 10 T. No significant increase of J(c)(local) is confirmed in the Bi-2212 layer at less than 2 mu m from the interface. However, J(c)(local) increases by performing the PAIR process in the middle part of the Bi-2212 layer 2-15 mu m from the interface. J(c)(local) is 2.4 x 10(5) A Cm-2 and 1.0 x 10(5) A Cm-2 at distances of 5 mu m and IO mu m from the interface respectively. The results indicate that the large J(c) enhancement by the PAIR process can be attributed to higher J(c)(local) in this middle part. J(c) improvement in the part near the free surface is also achieved by the PAIR process and contributes to high J(c). [References: 22]
机译:研究了PAIR(预退火和中间轧制)处理的Bi2Sr2CaCu2Ox(Bi-2212)/ Ag复合带的氧化物层中的临界电流密度(J(c))分布,以便为大J( c)通过PAIR流程进行增强。 Bi-2212 / Ag界面2微米内的氧化物层的J(c)在4.2 K和10 T下超过3.8 x 10(5)A cm(-2)。J(c)(局部确认在Bi-2212层中距界面不到2μm处。但是,J(c)(local)通过在Bi-2212层中部距界面2-15μm的中间部分执行PAIR处理而增加。 J(c)(local)在距接口5微米和IO微米的距离处分别为2.4 x 10(5)A Cm-2和1.0 x 10(5)A Cm-2。结果表明,通过PAIR处理实现的较大J(c)增强可归因于该中间部分中较高的J(c)(local)。 PAIR工艺还可实现自由表面附近部分的J(c)改善,并有助于提高J(c)。 [参考:22]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号