首页> 外文期刊>Spectrochimica Acta, Part B. Atomic Spectroscopy >Considerations of particle vaporization and analyte diffusion in single-particle inductively coupled plasma-mass spectrometry
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Considerations of particle vaporization and analyte diffusion in single-particle inductively coupled plasma-mass spectrometry

机译:单颗粒电感耦合等离子体质谱法中颗粒汽化和分析物扩散的考虑

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The intensity of individual gold nanoparticles with nominal diameters of 80,100,150, and 200 nm was measured using single-particle inductively coupled plasma-mass spectrometry (ICP-MS). Since the particles are not perfectly monodisperse, a distribution of ICP-MS intensity was obtained for each nominal diameter. The distribution of particle mass was determined from the transmission electron microscopy (TEM) image of the particles. The distribution of ICP-MS intensity and the distribution of particle mass for each nominal diameter were correlated to give a calibration curve. The calibration curves are linear, but the slope decreases as the nominal diameter increases. The reduced slope is probably due to a smaller degree of vaporization of the large particles. In addition to the degree of particle vaporization, the rate of analyte diffusion in the ICP is an important factor that determines the measured ICP-MS intensity. Simulated ICP-MS intensity versus particle size was calculated using a simple computer program that accounts for the vaporization rate of the gold nanoparticles and the diffusion rate and degree of ionization of the gold atoms. The curvature of the simulated calibration curves changes with sampling depth because the effects of particle vaporization and analyte diffusion on the ICP-MS intensity are dependent on the residence time of the particle in the ICP. Calibration curves of four hypothetical particles representing the four combinations of high and low boiling points (2000 and 4000 K) and high and low analyte diffusion rates (atomic masses of 10 and 200 Da) were calculated to further illustrate the relative effects of particle vaporization and analyte diffusion. The simulated calibration curves show that the sensitivity of single-particle ICP-MS is smaller than that of the ICP-MS measurement of continuous flow of standard solutions by a factor of 2 or more. Calibration using continuous flow of standard solution is semi-quantitative at best An empirical equation is formulated for the estimation of the position of complete vaporization of a particle in the ICP. The equation takes into account the particle properties (diameter, density, boiling point, and molecular weight of the constituents of the particle) and the ICP operating parameters (ICP forward power and central channel gas flow rate). The proportional constant and exponents of the variables in the equation were solved using literature values of ICP operating conditions for single-particle inductively coupled plasma-mass spectrometry (ICP-MS) and inductively coupled plasma-atomic emission spectrometry (ICP-AES) measurements of 6 kinds of particles in 12 studies. The calculated position is a useful guide for the selection of sampling depth or observation height for ICP-MS and ICP-AES measurements of single particles as well as discrete particles in a flow, such as laser-ablated materials and airborne particulates.
机译:使用单粒子电感耦合等离子体质谱法(ICP-MS)测量标称直径为80、100、150和200 nm的单个金纳米粒子的强度。由于颗粒并非完全单分散,因此对于每个公称直径均获得了ICP-MS强度分布。从颗粒的透射电子显微镜(TEM)图像确定颗粒质量的分布。将ICP-MS强度的分布与每个公称直径的颗粒质量的分布进行关联,以得出校准曲线。校准曲线是线性的,但是斜率随着公称直径的增加而减小。减小的斜率可能是由于大颗粒的汽化程度较小所致。除颗粒汽化程度外,ICP中分析物的扩散速率也是决定测量的ICP-MS强度的重要因素。使用简单的计算机程序计算出模拟的ICP-MS强度与粒径的关系,该程序考虑了金纳米颗粒的汽化速率以及金原子的扩散速率和离子化程度。模拟校准曲线的曲率随采样深度而变化,因为颗粒汽化和分析物扩散对ICP-MS强度的影响取决于颗粒在ICP中的停留时间。计算了代表高沸点和低沸点(2000和4000 K)和高和低分析物扩散速率(原子质量分别为10和200 Da)的四种组合的四种假设颗粒的校准曲线,以进一步说明颗粒汽化和分析物扩散。模拟的校准曲线显示,单颗粒ICP-MS的灵敏度比标准溶液连续流动的ICP-MS的灵敏度小2倍或更多。使用标准溶液连续流动进行的校准最多只能是半定量的。建立了一个经验方程式,用于估算ICP中颗粒完全汽化的位置。该方程式考虑了颗粒性质(颗粒组成的直径,密度,沸点和分子量)和ICP操作参数(ICP正向功率和中央通道气体流速)。使用ICP工作条件的文献值求解方程中变量的比例常数和指数,用于单粒子电感耦合等离子体质谱(ICP-MS)和电感耦合等离子体原子发射光谱(ICP-AES)测量12种研究中的6种颗粒。计算出的位置对于选择ICP-MS和ICP-AES测量流中单个粒子以及离散粒子(例如激光烧蚀的材料和空气中的微粒)的采样深度或观察高度非常有用。

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