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首页> 外文期刊>Solid state ionics >Electrical properties and microstructures of all-perovskite-oxide capacitors (SrRuO3/BaxSr1-xTiO3/SrRuO3)
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Electrical properties and microstructures of all-perovskite-oxide capacitors (SrRuO3/BaxSr1-xTiO3/SrRuO3)

机译:全钙钛矿型氧化物电容器(SrRuO3 / BaxSr1-xTiO3 / SrRuO3)的电性能和微观结构

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Single crystal epitaxial and polycrystalline thin film capacitors consisting entirely of perovskite oxides (SrRuO3/ BaxSr1-xTiO3 (20 nm)/SrRuO3) were fabricated on SrTiO3 and Si substrates by r.f. magnetron sputtering. The dielectric constants for single crystal epitaxial and polycrystalline capacitors were observed to be 681 and 274, respectively; this large difference in dielectric constants is suggested to be due to lattice distortion and grain boundaries. In spite of a thin thickness for BaxSr1-xTiO3 (20 nm), low leakage current densities for both capacitors (< 1 X 10(-7) A cm(-2) for a bias of +/-1.2 V) were observed, which is suggested to be due to high lattice matching at the interface between dielectric and electrode. In the microstructure of the polycrystalline capacitor, BaxSr1-xTiO3 (BSTO) and SrRuO3 (SRO) formed continuous columnar grains and showed epitaxial growth at the BSTO/SRO interface within each column; this microstructure was modeled as a 'local epitaxial film' which was situated between single crystal epitaxial and polycrystalline films. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 13]
机译:通过r.f在SrTiO3和Si衬底上制造了完全由钙钛矿氧化物(SrRuO3 / BaxSr1-xTiO3(20 nm)/ SrRuO3)组成的单晶外延和多晶薄膜电容器。磁控溅射。单晶外延和多晶电容器的介电常数分别为681和274。介电常数的较大差异是由于晶格畸变和晶界引起的。尽管BaxSr1-xTiO3的厚度较薄(20 nm),但两个电容器的漏电流密度均较低(对于+/- 1.2 V的偏压,<1 X 10(-7)A cm(-2)),这被认为是由于在电介质和电极之间的界面处的高晶格匹配。在多晶电容器的微观结构中,BaxSr1-xTiO3(BSTO)和SrRuO3(SRO)形成连续的柱状晶粒,并在每个柱内的BSTO / SRO界面处显示出外延生长。该微结构被建模为位于单晶外延膜和多晶膜之间的“局部外延膜”。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:13]

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