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La_(16)[Si_8N_(22)][SiON_3]_2 - A nitridosilicate with isolated, corner-sharing and edge-sharing tetrahedra

机译:La_(16)[Si_8N_(22)] [SiON_3] _2-氮化硅酸盐,具有孤立的,对角共享和对角共享的四面体

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The mixed anion oxonitridosilicate La_(16)[Si_8N_(22)][SiON_3]_2 has been synthesized by the reaction of LaN, finely ground SiO_2 and silicon diimide (Si(NH)2) at 1600 deg C in a radiofrequency furnace. The structure has been determined by single-crystal X-ray diffraction (La_(16)[Si_8N_(22)][SiON_3)_2, P1-bar, a = 5.718(2), b = 11.391(2), c=13.435(3)A, alpha = 112.02(3), beta = 90.19(3), gamma = 90.58(3) deg, V=811.1(3) A~3, Z = 2, R_1= 0.027, 4460 independent reflections, 258 refined parameters). Besides La~(3+) and non-condensed [SiON_3]~(7-) tetrahedra, there are chains of both corner-sharing and edge-sharing SiN_4 tetrahedra with additional Q~1-type SiN_4 groups attached to all non-edge-sharing SiN_4 units of the chain. The resulting infinite chains are alternately built up of pairs of edge-sharing [Si_2N_6]~(10-) units that are linked by a common nitrogen atom to two corner-sharing single branched Q~3-type SiN_4 tetrahedra. According to its low degree of condensation, La_(16)[Si_8N_(22)][SiON_3]_2 is moisture sensitive and undergoes rapid hydrolysis on exposure to air. Rietveld refinement of X-ray powder diffraction data is in accordance with the results of the single-crystal X-ray structure determination.
机译:混合阴离子氧杂三硅酸盐硅酸盐La_(16)[Si_8N_(22)] [SiON_3] _2是通过LaN,细磨的SiO_2和二酰亚胺硅(Si(NH)2)在射频炉中反应而合成的。结构已通过单晶X射线衍射确定(La_(16)[Si_8N_(22)] [SiON_3)_2,P1-bar,a = 5.718(2),b = 11.391(2),c = 13.435 (3)A,alpha = 112.02(3),beta = 90.19(3),gamma = 90.58(3)deg,V = 811.1(3)A〜3,Z = 2,R_1 = 0.027,4460个独立反射,258精炼参数)。除La〜(3+)和非缩合的[SiON_3]〜(7-)四面体之外,还有角共享和边共享的SiN_4四面体链,所有非边缘均附加有额外的Q〜1型SiN_4基团-共享链的SiN_4个单位。产生的无限链交替地由成对的边缘共享[Si_2N_6]〜(10-)单元对构成,这些单元通过共同的氮原子连接到两个共享角的单分支Q〜3型SiN_4四面体。 La_(16)[Si_8N_(22)] [SiON_3] _2由于其低的缩合度,因此对水分敏感,并且暴露于空气中会迅速水解。 X射线粉末衍射数据的Rietveld细化是根据单晶X射线结构测定的结果。

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