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Magnetron sputter deposition of WC-Ag and TiC-Ag coatings and their frictional properties in vacuum environments

机译:WC-Ag和TiC-Ag涂层的磁控溅射沉积及其在真空环境中的摩擦性能

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Thin films of WC-Ag and TiC-Ag were deposited by magnetron sputtering for the purpose of analyzing their tribological properties in vacuum. X-ray diffraction was used to determine structural properties, and energy dispersive X-ray analysis was used to determine the relative atomic content of silver in the films. Pin on disk friction tests were performed to obtain the coefficient of friction in vacuum. The deposited films showed a structure containing separate carbide/silver phases, as was desired for providing both high wear resistance and low friction. The tribological test results show a significant decrease in the friction coefficient for both TiC-Ag and WC-Ag, to a minimum value of 0.2, with increasing silver content.
机译:通过磁控溅射沉积WC-Ag和TiC-Ag薄膜,以分析它们在真空中的摩擦学性能。 X射线衍射用于确定结构性质,能量色散X射线分析用于确定薄膜中银的相对原子含量。进行销钉在磁盘上的摩擦测试,以获得真空中的摩擦系数。沉积的膜显示出包含分离的碳化物/银相的结构,这是提供高耐磨性和低摩擦力所期望的。摩擦学测试结果显示,随着银含量的增加,TiC-Ag和WC-Ag的摩擦系数均显着降低至最小值0.2。

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