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首页> 外文期刊>Scripta materialia >An improved relation for the effective elastic compliance of a film/substrate system during indentation by a flat cylindrical punch
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An improved relation for the effective elastic compliance of a film/substrate system during indentation by a flat cylindrical punch

机译:扁平圆柱冲头压入过程中膜/基材系统的有效弹性柔度的改进关系

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摘要

Measurement of the mechanical properties of thin films on substrates by load and depth sensing indentation methods such as nanoindentation often requires accurate descriptions for the effective elastic compliance of the film/substrate system. Here, a simple modification of the commonly used solution derived by Gao et al. [H. Gao, C.H. Chiu, J. Lee, Int. J. Solids Struct. (1992) 2471] is presented, that significantly improves its accuracy and range of applicability, as demonstrated by comparison with finite element simulations.
机译:通过诸如纳米压痕之类的载荷和深度感测压痕方法来测量衬底上薄膜的机械性能,通常需要对薄膜/衬底系统的有效弹性柔度进行准确描述。在这里,对高等人得出的常用解决方案进行了简单修改。 [H。高超邱杰(J. Lee,Int。) J.固体结构。 (1992)2471]提出,通过与有限元模拟的比较表明,它大大提高了其准确性和适用范围。

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