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The effect of component concentrations in electroless nickel plating solution on topography and microrelief of Ni-P coatings

机译:化学镀镍溶液中成分浓度对Ni-P涂层形貌和微浮雕的影响

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摘要

Topography and microrelief of Ni-P coatings deposited by electroless plating from solutions with different composition are examined as a function of concentrations of nickel and acetate ions, solution pH, and stabilizing additives, namely, PbCl2 and thiourea. The coating growth involves the formation of surface spheroids of which a large percentage are strongly extended in the substrate plane and grow by the layered-growth mechanism. In terms of this mechanism, the changes in the topography and microrelief of coatings and also in the spheroid size as a function of the composition of electroless nickel plating solutions are explained. In solutions studied, the rates of formation of new two-dimensional layers and their propagation in the substrate plane are assessed. As the concentration of hydrated nickel ions in solution decreases, spheroids less extended in the substrate plane are formed and grow probably by the normal growth mechanism. The size distribution of spheroids is obtained and the reasons for the partial formation of spheroids with sizes deviating from those predicted by the normal law are analyzed.
机译:通过化学镀从具有不同组成的溶液中沉积的Ni-P涂层的形貌和微浮雕,应作为镍和乙酸根离子浓度,溶液pH值以及稳定添加剂(即PbCl2和硫脲)的函数进行检查。涂层的生长涉及形成表面球状体,其中很大一部分在基底平面中强烈延伸,并通过分层生长机制生长。根据这种机理,解释了涂层的形貌和微浮雕以及球体尺寸随化学镀镍溶液组成的变化。在研究的解决方案中,评估了新的二维层的形成速率及其在基底平面中的传播。随着溶液中水合镍离子浓度的降低,可能会在正常的生长机制下形成并在基板平面上延伸较少的球状体并生长。获得了球状体的尺寸分布,并分析了部分形成尺寸偏离正常法则所预测的球状体的原因。

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