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首页> 外文期刊>Russian journal of electrochemistry >Effect of solution flow rate and direction on copper electrodeposition process from sulfuric acid electrolyte on porous electrode with high electric conductivity
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Effect of solution flow rate and direction on copper electrodeposition process from sulfuric acid electrolyte on porous electrode with high electric conductivity

机译:溶液流速和方向对高电导率多孔电极上硫酸电解液在铜电沉积过程中的影响

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摘要

The effect of solution flow direction and rate on the dynamics of copper electrodeposition onto a premetallized coal-graphite VINN-250 material from a dilute copper sulfate sulfuric acid solution is experimentally studied in the direct-flow mode. A light effect of solution supply on the copper deposit final mass for high and low solution flow rates is found, while the effect of this parameter on the metal distribution within the porous electrode is significant. The most uniform copper deposit distribution throughout the porous electrode is observed in the case of intermediate solution flow rates at its rear supply. The obtained experimental data agree qualitatively with the earlier published mathematical simulation results. Small systematic deviations from numeric calculations can be due to the process disregarded in the mathematical model: the effect of gas phase formed within the porous cathode due to the simultaneous hydrogen evolution.
机译:实验研究了溶液流动方向和速率对稀铜硫酸铜稀溶液中铜电沉积在预金属化煤-石墨VINN-250材料上动力学的影响。对于高和低溶液流速,发现溶液供应对铜沉积最终质量的轻微影响,而此参数对多孔电极内金属分布的影响非常明显。在后部供应时,如果溶液流速中等,则整个多孔电极上的铜沉积分布最均匀。获得的实验数据在质量上与较早发表的数学模拟结果一致。与数值计算的小的系统偏差可能归因于数学模型中忽略的过程:由于同时析氢,多孔阴极内形成的气相效应。

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