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Effect of ZnO seed layers on the solution chemical growth of ZnO nanorod arrays

机译:ZnO种子层对ZnO纳米棒阵列的溶液化学生长的影响

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High density ZnO nanorod arrays were grown on Si substrates coated with ZnO seed layers via aqueous solution route. The ZnO seed layers were deposited on the substrate using DC reactive sputtering and RF magnetron sputtering. It was found that ZnO seed layer with (1 0 3) preferred orientation, prepared using DC reactive sputtering, did not facilitate the formation of ZnO nanorods in the solution grown process. Prior seeding of the surface by ZnO layer with (0 0 2) preferred orientation, deposited using RF magnetron sputtering, leads to nucleation sites on which ZnO nanorod arrays can grow in a highly aligned fashion. ZnO nanorods with well-defined hexagonal facets (0 0 2) were grown almost vertically over the entire substrate. The uniformity and alignment of the nanorod arrays are strongly related to the properties of underneath ZnO seed layers.
机译:通过水溶液途径在涂覆有ZnO种子层的Si衬底上生长高密度ZnO纳米棒阵列。使用DC反应溅射和RF磁控管溅射将ZnO种子层沉积在基板上。发现使用直流反应溅射制备的具有(1 0 3)较好取向的ZnO晶种层在溶液生长过程中不促进ZnO纳米棒的形成。使用RF磁控溅射沉积的(0 0 2)首选取向的ZnO层预先在表面上进行晶种,会导致成核位置,ZnO纳米棒阵列可以高度对齐的方式生长在该成核位置。 ZnO纳米棒具有清晰的六边形小面(0 0 2),几乎在整个基板上垂直生长。纳米棒阵列的均匀性和排列与ZnO种子层下方的特性密切相关。

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