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Oxidation behavior of carbon materials derived from a carborane- and silicon-incorporated polymer

机译:碳硼烷和硅结合聚合物衍生的碳材料的氧化行为

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The oxidation behavior and oxidation mechanism of carbon materials containing silicon and boron elements (C-Si-B materials) were investigated at different high temperatures in air. The carbon materials were prepared by oxidative pyrolysis of the polymer precursor, carborane-incorporated poly(dimethylsilylene-ethynylenephenyleneethynylene) (CB-PSEPE), at 800, 1000, or 1200 °C for 1 h under static air. Homogeneous dispersion of silicon and boron components in the carbon matrix could be achieved in the carbon materials after the pyrolysis. The oxidation behavior of the C-Si-B materials during the oxidation process was studied. The evolution of elemental composition and morphology of the surface layers of carbon materials was monitored by X-ray photoelectron spectroscopy and scanning electron microscopy, respectively. The results imply that the formation of protective borosilicate layer in the surface is the main mechanism to provide remarkable oxidation resistance of the carbon materials. The obtained borosilicate layer with a self-healing property can withstand oxidation at 1000 °C in air.
机译:研究了含硅和硼元素的碳材料(C-Si-B材料)在空气中不同高温下的氧化行为和氧化机理。碳材料是通过在静态空气下于800、1000或1200°C下将聚合物前驱体,并有碳硼烷的聚(二甲基甲硅烷基-亚乙炔基亚苯基亚乙炔基)(CB-PSEPE)氧化热解1小时制得的。热解后,碳材料中的硅和硼成分均匀分散在碳基质中。研究了C-Si-B材料在氧化过程中的氧化行为。碳材料表面层的元素组成和形态的演变分别通过X射线光电子能谱和扫描电子显微镜进行监测。结果表明在表面形成保护性硼硅酸盐层是提供碳材料显着抗氧化性的主要机理。所获得的具有自愈特性的硼硅酸盐层可以在空气中于1000℃下经受氧化。

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