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Analysis of Image of Objective for Formation of Nanostructures by Computer Isophotometry Method

机译:用计算机等光光度法分析形成纳米结构物镜的图像

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摘要

The possibilities of using the computer isophotometry method to estimate the image quality of high-resolution projection objectives are considered. An experimental setup for measuring the point spread function is developed. A two-mirror objective of the Schwarzschild type with a numerical aperture of 0.36 designed for the use in an experimental nanolithographer is studied. Control measurements by the computer isophotometry method show that, at a wavelength of 13.4 nm, this objective is capable of resolving image features with a size of no larger than 50 nm.
机译:考虑了使用计算机等光光度法来估计高分辨率投影物镜的图像质量的可能性。开发了用于测量点扩散函数的实验装置。研究了设计用于实验纳米光刻机的数值孔径为0.36的Schwarzschild型双镜物镜。通过计算机等光光度法进行的控制测量表明,在13.4 nm的波长下,该物镜能够分辨不大于50 nm的图像特征。

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