A method for increasing the sensitivity of determination of the wavefront distortion in optical processing of holographic lateral shear interferograms

摘要

A method for obtaining interference patterns of increased sensitivity in optical processing of holographic lateral shear interferograms recorded under linear conditions at a shear exceeding the size of a phase object under study is proposed. Cases of reconstruction of interference patterns of increased sensitivity using matched and optically conjugate holographic lateral shear interferograms are considered. It is shown that two-and fourfold increases in sensitivity, respectively, are obtained in these cases. The validity of the method proposed is confirmed experimentally. (c) 2005 Pleiades Publishing, Inc.