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A Multiwavelength Low-Pressure Radiation Source Based on Argon and Xenon Chlorides

机译:基于氩和氯化氙的多波长低压辐射源

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摘要

The characteristics of an excimer radiation source pumped by a subnormal dc glow discharge in an Ar/Xe/Cl_(2) mixture with the source operating in a spectral range of 160-310 nm were studied. The emission intensities of the 175,236,258, and 308 nm bands due to the transitions ArCl (B-X), XeCl (D-X), Cl_(2) (D′-A′), and XeCl (B-X), respectively, were optimized in relation to the pressure, composition, and discharge current of the mixture.
机译:研究了在Ar / Xe / Cl_(2)混合物中通过次普通dc辉光放电泵浦的受激准分子辐射源的特性,该源工作在160-310 nm的光谱范围内。相对于ArCl(BX),XeCl(DX),Cl_(2)(D'-A')和XeCl(BX)的跃迁,分别优化了175,236,258和308 nm波段的发射强度混合物的压力,组成和放电电流。

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