A novel telecentricity measuring method for illumination system in lithography based on pinhole imaging

摘要

A methodology for measuring the telecentricity of illumination system in lithography tool based on the pinhole imaging is proposed. Illumination light goes through the pinhole located on the reticle plane and forms the pupil-fill image in CCD image sensor. Based on the Fresnel diffraction theory, the image intensity of source in CCD photosurface and the optimization of pinhole size are discussed. By simulating, effects of the stability of telecentricity measuring from non-uniformity of light field and pinhole defocus in different illumination patterns are analyzed respectively. Simulation results prove the effectiveness of this new method.