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首页> 外文期刊>Optics Letters >Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication
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Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication

机译:过度刻蚀制造引起的导模谐振滤波器的反射响应偏差的补偿

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摘要

Unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (GMRFs). Hence, the fabrication error control becomes a key point for improving the performance of GMRF. We find that, within the range of the groove depth from 93 to 105 nm, the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the GMRF. Simulation results show that the deviation is compensated perfectly by this way.
机译:除非对制造误差控制进行了很​​好的处理,否则它很容易引起过度蚀刻的制造误差,从而在导模谐振滤波器(GMRF)的制造过程中引起谐振峰值偏差。因此,制造误差控制成为改善GMRF性能的关键。我们发现,在凹槽深度从93到105 nm的范围内,过蚀刻误差与共振峰值偏差之间的关系几乎是线性的,这意味着我们可以补偿反射响应偏差并减小共振峰值偏差。通过在GMRF上覆盖层膜的方法。仿真结果表明,该方法可以很好地补偿偏差。

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