Low-loss, low-cross-talk crossings for silicon-on-insulator nanophotonic waveguides

摘要

We present compact crossings for silicon-on-insulator photonic wires. The waveguides are broadened using a3 (mu)m parabolic taper in each arm. By locally applying a lower index contrast using a double-etch technique, loss of confinement is reduced and 97.5percent transmission (-1.7 dB) is achieved with only -40 dB cross talk.