ELECTRON BEAM FABRICATION OF SCATTER PLATE FOR SCATTER PLATE INTERFEROMETER

摘要

We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 mu m. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter place are discussed and interferometric experiments are presented. (C) 1997 Elsevier Science B.V. [References: 18]