首页> 外文期刊>Rubber Chemistry and Technology >EFFECTS OF DISSOLVED OXYGEN ON THE INTEGRITY OF INDUSTRIAL CHLORINATED RUBBER-BASED PRIMER USED IN RUBBER/METAL COMPOSITES
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EFFECTS OF DISSOLVED OXYGEN ON THE INTEGRITY OF INDUSTRIAL CHLORINATED RUBBER-BASED PRIMER USED IN RUBBER/METAL COMPOSITES

机译:溶解氧对用于橡胶/金属复合材料的工业氯化橡胶底料完整性的影响

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Electrochemical impedance spectroscopy (EIS) was employed to study the properties of a stand-alone industrial coating Chemlok 205 (R) primer used in rubber/metal-bonded composites in water. The impedance behavior was observed between systems exposed in aerated and de-aerated systems. The coating properties were interpreted through Nyquist and Bode's EIS plots. Equivalent electrical circuit models derived from the spectra were employed to describe the degradation process of the coatings. Data obtained showed that coating samples exposed under aerated water experienced a significant drop in impedance followed by the development of a corrosion cell. Data from the Nyquist and Bode's plots were used to model the electrical equivalent circuits that described the overall coating degradation process. The degradation process for the aerated system can be represented by three different equivalent electrical circuits, indicating a reduction of the coating impedance against the exposure time. This was, however, not the case for the de-aerated coating system, which was found to have been able to maintain high coating impedance values and good adhesion throughout the duration of the experiment. A comparison on the change in the coating capacitance and pore resistance of the Chemlok 205 primer between the aerated and de-aerated water systems indicated that dissolved oxygen significantly contributed to the adhesion failure of the coating. A Fourier transform infrared spectroscopy analysis conducted after alkaline exposure to represent the coating in alkaline medium when subjected to cathodic polarization confirmed the chemical degradation of the primer caused by hydroxide attack. The analysis shows a natural reaction of the acidic phenolic group within the primer, with the basic hydroxide ions resulting in the formation of a phenolic salt or phenoxides.
机译:电化学阻抗谱(EIS)用于研究用于橡胶/金属粘结复合材料在水中的独立工业涂料Chemlok 205(R)底漆的性能。在曝气和脱气系统中暴露的系统之间观察到阻抗行为。通过Nyquist和Bode的EIS图可以解释涂层的性能。由光谱得出的等效电路模型被用来描述涂层的降解过程。获得的数据表明,暴露在充气水中的涂层样品的阻抗显着下降,随后形成腐蚀池。 Nyquist和Bode曲线的数据被用来模拟描述整个涂层退化过程的等效电路。充气系统的降解过程可以用三个不同的等效电路表示,表明涂层阻抗随暴露时间的减少而降低。但是,对于脱气涂层系统则不是这种情况,该系统发现在整个实验过程中都能保持较高的涂层阻抗值和良好的附着力。在充气和脱气的水系统之间对Chemlok 205底漆的涂层电容和抗孔性变化的比较表明,溶解氧显着促进了涂层的粘合失败。碱暴露后进行的傅立叶变换红外光谱分析代表碱性介质中的涂层在经受阴极极化时证实了由氢氧化物侵蚀引起的底漆的化学降解。分析表明,底漆中的酸性酚基与碱性氢氧根离子自然反应,导致形成酚盐或酚盐。

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