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首页> 外文期刊>RSC Advances >Effects of nanoscale silica sol foliar application on arsenic uptake, distribution and oxidative damage defense in rice (Oryza sativa L.) under arsenic stress
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Effects of nanoscale silica sol foliar application on arsenic uptake, distribution and oxidative damage defense in rice (Oryza sativa L.) under arsenic stress

机译:纳米硅溶胶叶面施用对砷胁迫下水稻(Oryza sativa L.)砷吸收,分布和氧化损伤防御的影响

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摘要

It has been widely reported that silicon (Si) can enhance rice resistance and/or tolerance to arsenic (As) toxicity; however, there is very little evidence suggesting that nanoscale silica foliar applications can decrease As accumulation in rice grains grown in As-contaminated environments. This study is aimed at investigating the mechanism of nanoscale silica sol foliar applications on the alleviation of As toxicity and reduction of its accumulation in rice. Pot, field and hydroponics experiments were conducted to study the effects of nanoscale silica sol foliar application on biomass and As accumulation in rice plants. The electrolyte leakage (EL), malondialdehyde (MDA) content, and activity of antioxidant enzymes were also examined in rice, grown in a 50 or 100 mM As contained nutrition, with or without 5 mM nanoscale silica sol foliar pretreatment. The results showed that nanoscale silica sol foliar application significantly increased the grain yields, while decreasing the As concentration of brown rice in pot and field experiments, induced more As combined on the cell walls of shoots, decreased EL and MDA content in roots and increased the activity of antioxidant enzymes, including superoxide dismutase (SOD), preoxidase (POD), catalase (CAT), and asorbate peroxidase (APX) in the roots of rice seedlings grown in the As contained nutrition. These results indicated that nanoscale silica sol foliar application was effective in the alleviation of As toxicity and accumulation in rice. These were mainly attributed to the enhanced antioxidant defense capacity resulting from the Si treatments. The mechanism of nanoscale silica foliar application to alleviate the toxicity and accumulation of As in grains of rice may also be related to the probable As sequestration in the shoot cell walls.
机译:广泛报道硅(Si)可以增强稻米的抗性和/或砷(As)毒性的耐受性。然而,几乎没有证据表明纳米级硅叶的应用可以减少在被As污染的环境中生长的水稻籽粒中As的积累。这项研究旨在研究纳米级硅溶胶叶面应用减轻水稻中As毒性并减少其积累的机理。通过盆栽,田间和水培试验研究了纳米级硅溶胶叶面施肥对水稻生物量和砷积累的影响。还对含有或不含5 mM纳米级硅溶胶叶面预处理的50或100 mM含营养的大米中的电解质泄漏(EL),丙二醛(MDA)含量和抗氧化酶活性进行了检测。结果表明,在盆栽和田间试验中,纳米级硅溶胶叶面施用显着提高了谷物产量,同时降低了糙米中的砷浓度,在枝条的细胞壁上诱导了更多的砷结合,降低了根中EL和MDA含量,并增加了含砷的水稻幼苗根系中抗氧化剂酶的活性,包括超氧化物歧化酶(SOD),预氧化酶(POD),过氧化氢酶(CAT)和山梨酸酯过氧化物酶(APX)。这些结果表明,纳米级硅溶胶叶面施用可有效减轻水稻中砷的毒性和积累。这些主要归因于Si处理导致的抗氧化防御能力增强。纳米二氧化硅叶面施用减轻水稻籽粒中As的毒性和积累的机理也可能与芽细胞壁中As的螯合有关。

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