首页> 外文期刊>Radiation Physics and Chemistry >Optimization of phantom backscatter thickness and lateral scatter volume for radiographic film dosimetry
【24h】

Optimization of phantom backscatter thickness and lateral scatter volume for radiographic film dosimetry

机译:射线照相胶片剂量法的幻像背向散射厚度和横向散射体积的优化

获取原文
获取原文并翻译 | 示例
           

摘要

The aim of this study is to determine the optimal backscatter thickness and lateral phantom dimension beyond the irradiated volume for the dosimetric verification with radiographic film when applying large field sizes. Polystyrene and Virtual Water? phantoms were used to study the influence of the phantom backscatter thickness. EDR2 and XV films were used in 6 and 18 MV photon beams. The results show 11.4% and 6.4% over-response of the XV2 film when compared to the ion chamber for 6 MV 30 x 30 and 10 x 10 cm~2 field sizes, respectively, when the phantom backscatter thickness is 5 cm. For the same setup, measurements with EDR2 films indicate 8.5% and 1.7% over-response. The XV2 film response in the polystyrene phantom is about 2.0% higher than in the Virtual Water? phantom for the 6 MV beam and 20 cm backscatter thickness. Similar results were obtained for EDR2 film. In the lateral scatter study, film response was nearly constant within 5 cm of lateral thickness and it increases when lateral thickness increases due to more multiple scatter of low energy photons. The backscatter thickness of the phantom should be kept below 7 cm for the accuracy of the film dosimetry. The lateral extension of the phantom should not be more than 5 cm from the field boundary in case of large irradiated volumes.
机译:这项研究的目的是确定大视野时,用射线照相胶片进行剂量学验证时,应确定超出照射体积的最佳反向散射厚度和横向幻像尺寸。聚苯乙烯和虚拟水?体模用于研究体模反向散射厚度的影响。 EDR2和XV膜用于6和18 MV光子束。结果表明,当幻影后向散射厚度为5 cm时,对于6 MV 30 x 30和10 x 10 cm〜2的场尺寸,与离子室相比,XV2膜的过响应分别为11.4%和6.4%。对于相同的设置,使用EDR2胶片进行的测量表明响应过度为8.5%和1.7%。聚苯乙烯幻影中的XV2胶片响应比虚拟水高出约2.0%? 6 MV光束和20 cm反向散射厚度的幻像。对于EDR2膜也获得了类似的结果。在横向散射研究中,薄膜响应在横向厚度的5 cm内几乎恒定,并且由于低能光子的更多次散射而导致横向厚度增加时,薄膜响应增加。体模的背向散射厚度应保持在7 cm以下,以确保薄膜剂量测定的准确性。如果辐射量大,则幻影的横向延伸距离场边界不应超过5 cm。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号