A low cost, bench top EB unit for R & D

摘要

USHIO America, Inc. has introduced the U-eLektron~(TM), a bench top electron beam exposure system designed for R&D applications that is reasonably priced, starting at $17000. The system includes the electron beam gun, exposure chamber, and controller/power supply. The USHIO Ebeam sources provide electron beams with potentials of 10-50 keV. These units are said to be compact and self-shielding. The systems are modular, appear user friendly and are designed for ease of maintenance.