Deposition of Ni/TiN Composite Coatings by a Plasma Assisted MOCVD Using an Organometallic Precursor

摘要

Titanium nitride (TiN)ickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis(eta~(5)-cyclopentadienyl) titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N_(2)) plasma environment in the substrate temperature range of 450-550 deg C at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 +- 5.6 kJ mol~(-1) for the standard enthalpy of sublimation ((DELTA)H_(sub)~(deg)). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films.