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机译:
Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30043, Taiwan;
thin films; cobalt silicides; interlayer; INSITU STRAIN-MEASUREMENTS; OXIDE-MEDIATED EPITAXY; SINGLE-CRYSTAL COSI2; TISI2 THIN-FILMS; COBALT SILICIDE; MU-M; REACTIVE DEPOSITION; INTERFACE ROUGHNESS; GROWTH; SI;
机译:A Comparative Study on the Shape Evolution of the TiC Particles in Ti-C, Ti-Al-C, and Ti-Si-C Systems after HF Treatment
机译:Stress evolution of Ni/Pd/Si reaction system under isochronal annealing
机译:Stress evolution during isochronal annealing of Ni/Si system
机译:通过高能球磨和随后的热处理制备Ti + Ti_6Si_2b + Ti_5Si_3和Ti + Ti_6Si_2b + Tib粉末
机译:脉冲烧结法制备的Fe-Mn-Si和Ni-Ti形状记忆合金的性能
机译:Nb-24Ti-18Si-5Al-5Cr-5Ge和Nb-24Ti-18Si-5Al-5Cr-5Ge-5Hf(at。%)硅化物基合金的组织和硬度
机译:通过从TiB2,Ti33Al67和Ti85Si15阴极阴极电弧蒸发生成的无定形电弧蒸发的Ti-B-Si-N和Ti-B-Si-Al-N涂层的热稳定性和力学性能
机译:耐火硅化物Ti5si3和Tisi2及相关Ti-si-(al)共晶合金的结构与性能