机译:利用原子层沉积Al2O3有效优化多孔碳化硅表面钝化
Tech Univ Denmark, Dept Photon Engn, DK-2800 Lyngby, Denmark;
Meijo Univ, Dept Mat Sci & Engn, Tenpaku Ku, 1-501 Shiogamaguchi, Nagoya, Aichi 4688502, Japan;
机译:y Si Surface Passivation by Atomic Layer Deposited Al2O3 with In-Situ H2O Prepulse Treatment
机译:Enhanced Surface Passivation by Atomic Layer-Deposited Alsub2/subOsub3/sub for Ultraviolet-Sensitive Silicon Photomultipliers
机译:Passivation Properties of Atomic-Layer-Deposited Hafnium and Aluminum Oxides on Si Surfaces
机译:LOW-TEMPERATURE EMISSIVITY OF THIN AL2O3 LAYERS DEPOSITED ON COPPER SUBSTRATE