机译:磁控溅射外延法制备的钪浓度高达x=0.41的纤锌矿Al1-xScxN/Al2O3的光学常数和带隙
Fraunhofer Inst Appl Solid State Phys IAF, Tullastr 72, D-79108 Freiburg, Germany;
Univ Freiburg, Dept Sustainable Syst Engn INATECH, Emmy Noether Str 2, D-79110 Freiburg, Germany;
机译:Growth of wide band gap wurtzite ZnMgO layers on (0001) Al2O3 by radical-source molecular beam epitaxy
机译:Influence of sputtering power and Ar-N-2 flow on the structure and optical properties of indium nitride films prepared by magnetron sputtering
机译:EFFECT OF OXYGEN CONCENTRATION IN THE SPUTTERING AMBIENT ON THE MICROSTRUCTURE, ELECTRICAL AND OPTICAL PROPERTIES OF RADIO-FREQUENCY MAGNETRON-SPUTTERED INDIUM TIN OXIDE FILMS