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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Photooxidation of a Mustard Gas Simulant over Mixed-Oxide Photocatalyst:Site Poisoning by Oxidation Products and Reactivation
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Photooxidation of a Mustard Gas Simulant over Mixed-Oxide Photocatalyst:Site Poisoning by Oxidation Products and Reactivation

机译:混合氧化物光催化剂上芥子气模拟物的光氧化:氧化产物和活化引起的中毒

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摘要

The photooxidation of 2-chloroethyl ethyl sulfide (2-CEES),a simulant for mustard gas,was studied using transmission IR spectroscopy on a mixed-oxide TiO2~SiO2 photocatalyst.Ultraviolet irradiation in the photon energy range from 2.1 to 5 eV was employed at a catalyst temperature of 200 K.Rapid photooxidation was observed by the loss of infrared intensity in the v(CH_x)stretching region,and concomitant infrared features of adsorbed oxidation products were observed to develop.The oxidation products,captured on the photocatalyst at 200 K,were found to block 2-CEES readsorption.Upon heating the poisoned photocatalyst to about 300 K,infrared measurements indicate that the adsorbed CO_2 oxidation product was desorbed.The capability for full readsorption of 2-CEES was achieved upon heating the poisoned photocatalyst to 397 K,and continued rapid photooxidation of the 2-CEES was then possible at about 1/3 the rate found for the fresh catalyst.Thus thermal treatment at 397 K of oxidation-product-poisoned TiO_2-SiO_2 material is able to partially restore the TiO_2-SiO_2 photooxidation activity.
机译:采用透射红外光谱法研究了混合氧化物TiO2〜SiO2光催化剂上2-芥子气模拟物2-氯乙基乙基硫(2-CEES)的光氧化作用,并在2.1至5 eV的光子能量范围内进行了紫外线照射。在200 K的催化剂温度下,由于v(CH_x)拉伸区域中红外强度的损失而观察到快速的光氧化,并观察到了吸附的氧化产物的伴随红外特征的发展.200℃下捕获在光催化剂上的氧化产物发现K阻止了2-CEES的再吸收。将中毒的光催化剂加热到约300 K时,红外测量表明所吸附的CO_2氧化产物被解吸。 397 K,然后可能继续以2-CEES进行快速的光氧化,速度约为新鲜催化剂的1/3。因此,在397 K下进行热处理可氧化生成t中毒的TiO_2-SiO_2材料能够部分恢复TiO_2-SiO_2的光氧化活性。

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