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机译:
CALTECH, Div Chem & Chem Engn, Pasadena, CA 91125, USA, .;
rovidence.org;
机译:Increased hole trapping in gate oxides as latent damage from plasma charging
机译:THIN-OXIDE MOS DAMAGE CAUSED BY WAFER CHARGING IN MAGNETIZED HELIUM PLASMA
机译:Charging damage to gate oxides in an O2magnetron plasma
机译:A Compact Model of Hafnium-Oxide-Based Resistive Random Access Memory
机译:plasma membranes modified by plasma Treatment or Deposition as solid Electrolytes for potential application in solid alkaline Fuel Cells