Tantalum ions produced by 1064 nm pulsed laser irradiation

摘要

A Q-switched Nd:YAG (yttrium aluminum garnet) laser (1064 nm wavelength) with a 9 ns pulse width, 1-900 mJ pulse energy, and 0.5 mm~(2) target spot, is employed to irradiate tantalum targets in vacuum. The irradiation produces a strong etching of the metal and forms a plasma in front of the target. The plasma contains neutrals and ions with a high charge state and a wide energy distribution. Time-of-flight measurements are presented for the ionic production. A cylindrical electrostatic ion analyzer permits to measure the yield and the charge state of the emitted ions and to extrapolate the ion energy distribution as a function of the laser fluence in the range 10-100 J/cm~(2). The measurements indicate that at high laser fluence the tantalum charge state may reach 8+ and the maximum ion energy about 6 keV. The ion energy distribution is presented as a function of the charge state. It follows approximately a "shifted Maxwellian distribution." A better theoretical approach has been further developed considering the Coulomb interactions occurring inside the plasma, which produce ion acceleration at velocities comparable with thermal ones, according to the so-called "shifted Maxwellian-Coulombian distribution."