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Generalized curvature and Ricci tensors for a higher spin potential and the trace anomaly in external higher spin fields in AdS(4) space

机译:较高的自旋势和AdS(4)空间中外部较高自旋场中的轨迹异常的广义曲率和Ricci张量

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The curvature of a higher spin potential as constructed in a previous article of the same authors [R. Manvelyan, W. Ruhl, The generalized curvature and Christoffel symbols for a higher spin potential in AdS(d+l) space, arXiv: 0705.3528 [hep-th]] is applied to the analysis of the linearized trace anomaly obtained from the quadratic part of the effective action for a conformally coupled scalar with linearized interaction with the external higher spin fields [R. Manvelyan, W. Ruhl, The structure of the trace anomaly of higher spin conformal currents in the bulk of AdS(4), Nucl. Phys. B 751 (2006) 285, hep-th/0602067]. The spin is restricted to four to profit from technical simplifications but without reducing the problem in principle. The issue includes the calculation of all Ricci tensors as multiple traces of the curvature, the derivation of all primary and secondary Bianchi identities, expressing all Ricci tensors as differential operators applied to the Fronsdal term, calculating the Weyl variation of these, and showing finally that Weyl variations of integrals over contracted squares of Ricci tensors can be used to eliminate the anomaly completely. This peculiarity is discussed in detail. As tools we use the formalism of bisymmetric tensor fields whose space is equipped with a local bilinear invariant form, the *-form. (c) 2007 Elsevier B.V. All rights reserved.
机译:在同一作者的上一篇文章中构建的更高自旋势的曲率[R. Manvelyan,W. Ruhl,关于AdS(d + 1)空间中较高自旋势的广义曲率和Christoffel符号,arXiv:0705.3528 [hep-th]]用于分析从二次部分获得的线性迹线异常与外部较高自旋场线性相互作用的共形耦合标量的有效作用[R. Manvelyan,W. Ruhl,AdS(4)主体中较高自旋保形电流的迹线异常结构。物理B 751(2006)285,hep-th / 0602067]。旋转限制为四个,以从技术简化中获利,但原则上不减少问题。问题包括将所有Ricci张量计算为曲率的多条迹线,推导所有主要和次要Bianchi恒等式,将所有Ricci张量表示为应用于Fronsdal项的微分算子,计算这些Weic的Weyl变异,最后表明Ricci张量的收缩平方上的积分的Weyl变化可用于完全消除异常。详细讨论了这种特殊性。作为工具,我们使用双对称张量场的形式主义,其空间配备有局部双线性不变形式* *形式。 (c)2007 Elsevier B.V.保留所有权利。

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