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Inelastic electron tunneling spectroscopy: Capabilities and limitations in metal-oxide-semiconductor devices

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摘要

We report on inelastic electron tunneling spectroscopy of a tunneling metal-oxide-semiconductor (MOS) device over an extended energy range compared to previous results. We have clearly observed the vibrations of the hydrogen-passivated (111)Si P_(b) center in this extended energy range. The assignment of this mode has been confirmed by a comparison with infrared experiments. Capabilities and limitations of the technique to detect and observe molecular vibrations in tunneling MOS devices are discussed.

著录项

  • 来源
    《Journal of Applied Physics》 |2002年第9期|5896-5901|共6页
  • 作者单位

    Laboratoire d'Analyse des Solides, Surfaces et Interfaces, LASSI-DTI, UMR CNRS 6107, Universite de Reims, BP 1039, 51687 Reims Cedex 2, France;

    rovidence.org;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

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