...
首页> 外文期刊>Materials Science >METAL SITE DOPING IN THE NARROW-GAP FeGa_3 SEMICONDUCTOR
【24h】

METAL SITE DOPING IN THE NARROW-GAP FeGa_3 SEMICONDUCTOR

机译:窄间隙FeGa_3半导体中的金属位点掺杂

获取原文
获取原文并翻译 | 示例

摘要

The effects and feasibility of metal site doping of the tetragonal diamagnetic insulator FeGa_3 by Fe/Co, Fe/Mn, and Co/Ni substitutions were investigated by the X-ray electron-probe microanalysis, electrical resistivity, specific heat, and magnetic susceptibility measurements. The substitution of Co for Fe in FeGa_3 does not change its structural type and preserves the structure of the binary parent compound (FeGa_3), whereas the solubility of Mn in the FeGa_3 -type structure is limited to 3 at.% and a finite solubility of Ni in CoGa3 is not detected.
机译:通过X射线电子探针显微分析,电阻率,比热和磁化率测量,研究了用Fe / Co,Fe / Mn和Co / Ni替代四方抗磁绝缘子FeGa_3进行金属位点掺杂的效果和可行性。 。 FeGa_3中用Co代替Fe不会改变其结构类型,并保留了二元母体化合物(FeGa_3)的结构,而Mn在FeGa_3型结构中的溶解度限制为3 at。%,且有限溶解度为未检测到CoGa3中的Ni。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号