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Bottom-up approach for the low-cost synthesis of graphene-alumina nanosheet interfaces using bimetallic alloys

机译:自下而上的使用双金属合金低成本合成石墨烯-氧化铝纳米片界面的方法

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The production of high-quality graphene-oxide interfaces is normally achieved by graphene growth via chemical vapour deposition on a metallic surface, followed by transfer of the C layer onto the oxide, by atomic layer and physical vapour deposition of the oxide on graphene or by carbon deposition on top of oxide surfaces. These methods, however, come with a series of issues: they are complex, costly and can easily result in damage to the carbon network, with detrimental effects on the carrier mobility. Here we show that the growth of a graphene layer on a bimetallic Ni3Al alloy and its subsequent exposure to oxygen at 520 K result in the formation of a 1.5 nm thick alumina nanosheet underneath graphene. This new, simple and low-cost strategy based on the use of alloys opens a promising route to the direct synthesis of a wide range of interfaces formed by graphene and high-k dielectrics.
机译:高质量的石墨烯-氧化物界面的生产通常是通过石墨烯的生长来实现的,方法是通过在金属表面上化学气相沉积进行石墨烯生长,然后将C层转移到氧化物上,通过原子层和氧化物在石墨烯上的物理气相沉积或通过碳沉积在氧化物表面的顶部。然而,这些方法存在一系列问题:它们复杂,昂贵且容易造成碳网络损坏,并对载流子迁移率产生不利影响。在这里,我们显示出在双金属Ni3Al合金上石墨烯层的生长及其随后在520 K下暴露于氧气会导致在石墨烯下方形成1.5 nm厚的氧化铝纳米片。这种基于合金使用的新的,简单的,低成本的策略为直接合成由石墨烯和高k电介质形成的各种界面开辟了一条有希望的途径。

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