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Tandem intercalation strategy for single-layer nanosheets as an effective alternative to conventional exfoliation processes

机译:单层纳米片的串联插入策略可作为常规剥离方法的有效替代方法

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Simple and effective generation of transition metal chalcogenides (TMCs) in a single-layer form has been a challenging task. Here we present a tandem molecular intercalation (TMI) as a new exfoliation concept for producing single-layer TMCs from multi-layer colloidal TMC nanostructures in solution phase. TMI requires tandem Lewis base intercalates, where short 'initiator' molecules first intercalate into TMCs to open up the interlayer gap, and the long 'primary' molecules then bring the gap to full width so that a random mixture of intercalates overcomes the interlayer force. Spontaneous exfoliation then yields single-layer TMCs. The TMI process is uniquely advantageous because it works in a simple one-step process under safe and mild conditions (that is, room temperature without sonication or H-2 generation). With the appropriate intercalates, we have successfully generated single-layer nanostructures of group IV (TiS2, ZrS2), group V (NbS2) and VI (WSe2, MoS2) TMCs.
机译:单层形式简单有效地生成过渡金属硫属元素化物(TMC)是一项艰巨的任务。在这里,我们提出串联分子插层(TMI)作为一种新的剥落概念,用于从多层胶体TMC纳米结构在溶液相中生产单层TMC。 TMI需要串联的Lewis碱插入物,其中短的“引发剂”分子首先插入TMC中以打开层间间隙,然后长的“主”分子将间隙带到全宽度,以便无序的插入物混合物克服层间作用力。然后自然剥落产生单层TMC。 TMI工艺具有独特的优势,因为它可以在安全和温和的条件下(即室温下不进行超声处理或产生H-2)以简单的一步操作进行工作。通过适当的插入,我们已经成功地生成了IV组(TiS2,ZrS2),V组(NbS2)和VI(WSe2,MoS2)TMC的单层纳米结构。

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