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Conductive AFM microscopy study of the carrier transport and storage in Ge nanocrystals grown by dewetting

机译:导电AFM显微镜研究通过去湿生长的Ge纳米晶体中载流子的迁移和存储

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A combined conductive atomic force microscope (C-AFM)/scanning electron microscope (SEM) has been used to study the electric transport and retention mechanisms through Ge nanocrystals (NCs). The NCs were formed by a two-step dewettingucleation process on a silicon oxide layer grown on n-doped < 001 > silicon substrate. Without preliminary e-beam irradiation, electric images are obtained only with bias voltages larger than 8 V. This is due to the barrier height introduced by the presence of the native oxide on NCs and of the oxide layer on which the NCs are grown. After acquisition of an e-beam-induced current image, electric images (e-beam off) can be easily obtained at low bias voltages because of the trap creation in the oxide layer. We show that the critical threshold voltage to detect a current through the NCs decreases with NCs size. The band diagram of the contact in the presence of a p-doped diamond coated tip shows that the conduction mechanism is dominated by holes. At last we show a good memory effect with charge/discharge in the NCs resulting in a long retention time.
机译:组合式导电原子力显微镜(C-AFM)/扫描电子显微镜(SEM)已用于研究通过Ge纳米晶体(NC)的电迁移和固位机理。通过两步去湿/成核工艺在生长在n掺杂的<001>硅衬底上的氧化硅层上形成NC。没有初步的电子束照射,仅在大于8 V的偏置电压下才能获得电图像。这是由于在NC上存在天然氧化物以及在其上生长NC的氧化物层所引入的势垒高度所致。在获取电子束感应的电流图像之后,由于在氧化物层中产生了陷阱,因此可以在低偏置电压下轻松获得电子图像(电子束关闭)。我们显示,检测通过NC的电流的临界阈值电压随NC尺寸的减小而降低。在存在p掺杂的金刚石涂层尖端的情况下,接触的能带图显示,导电机制受空穴支配。最后,我们在NC中表现出良好的记忆效应和充放电,从而导致较长的保留时间。

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