Submicron patterning of Co colloid catalyst for growth of vertically aligned carbon nanotubes

摘要

Applications of carbon nanotubes such as field emission or microelectrode sensor arrays require a patterning of vertically aligned carbon nanotubes over large areas. A highly purified and concentrated monodisperse cobalt colloid was produced for use as a catalyst for growth of carbon nanotubes. Nanocontact printing was employed to deposit the cobalt nanoparticles in regular patterns with feature sizes at the 100 nm scale onto silicon wafers at low cost over large areas. Vertically aligned carbon nanotubes were grown by direct current plasma enhanced chemical vapour deposition at temperatures ranging from 300 to 640 deg C.