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Phase-sensitive lock-in imaging of surface densities of states

机译:态密度的相敏锁定成像

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A new way of imaging the local density of states has been devised through a combination of the constant-height scanning tunnelling microscopy operational mode and lock-in techniques. We have obtained current images simultaneously with real space dynamical conductance maps (dI/dV) for energies around the Fermi level, on the Si(111)-(7 X 7) surface. We reconstructed the normalized dynamical conductance spectra-(dI/dV)/(I/V). Since the (dI/dV)/(I/V) curves are closely related to the local densities of states, we compared their sum over the unit cell to photoelectron spectra and theoretical calculations. We find that the results are in good agreement. Consequently, the extent of localization of surface electronic states at lattice positions was determined.
机译:通过恒定高度扫描隧道显微镜操作模式和锁定技术的组合,已经设计出一种成像状态局部密度的新方法。我们同时在Si(111)-(7 X 7)表面上获得了具有费米能级附近能量的真实空间动态电导图(dI / dV)的当前图像。我们重建了归一化的动态电导谱-(dI / dV)/(I / V)。由于(dI / dV)/(I / V)曲线与状态的局部密度密切相关,因此我们将它们在晶胞上的总和与光电子光谱进行了比较,并进行了理论计算。我们发现结果非常吻合。因此,确定了表面电子态在晶格位置上的局部化程度。

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