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首页> 外文期刊>Nanotechnology >Contrast inversion in electrostatic force microscopy imaging of trapped charges: Tip-sample distance and dielectric constant dependence
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Contrast inversion in electrostatic force microscopy imaging of trapped charges: Tip-sample distance and dielectric constant dependence

机译:静电力显微镜下捕获电荷的对比度反演:尖端样品距离和介电常数依赖性

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摘要

We present a numerical and analytical study of the behavior of both electrostatic force and force gradient created by a charge trapped below the surface of a dielectric on an atomic force microscope tip as a function of the dielectric constant and tip-sample distance. As expected, the force decreases monotonously when the dielectric constant increases. However, a maximum in the dielectric constant dependence of the force gradient is found. This maximum occurs in the typical experimental parameters' range and depends on the tip-sample distance and the sample thickness. The analytical study permits us to understand the physical origin of this phenomenon and is in good agreement with the numerical simulation for small tip-sample distances. We also report a study exemplifying a possible contrast inversion in electrostatic force microscopy (EFM) signals while scanning, at different heights, two charges trapped in a sample having heterogeneous dielectric domains. In addition to this particular contrast inversion effect, this study can be considered as a way to gain insight into the mechanisms of EFM image formation as a function of the dielectric constant and tip-sample.
机译:我们对静电力和由电荷在原子力显微镜尖端上的电介质表面下方捕集的电荷所产生的力梯度的行为进行了数值和分析研究,该函数是介电常数和尖端样品距离的函数。如所预期的,当介电常数增加时,力单调减小。然而,发现力梯度的介电常数依赖性最大。该最大值出现在典型的实验参数范围内,并取决于吸头样品距离和样品厚度。分析研究使我们能够了解这种现象的物理原因,并且与小尖端样品距离的数值模拟非常吻合。我们还报告了一项研究,该研究例证了在静电力显微镜(EFM)信号中,以不同的高度扫描捕获在具有异质介电域的样品中的两个电荷时可能产生的反差。除了这种特殊的反演效果外,这项研究还可以作为一种手段来洞察作为介电常数和尖端样本函数的EFM图像形成机理。

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