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首页> 外文期刊>Nano Energy >Electroless plated Ni-B-x films as highly active electrocatalysts for hydrogen production from water over a wide pH range
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Electroless plated Ni-B-x films as highly active electrocatalysts for hydrogen production from water over a wide pH range

机译:化学镀Ni-B-x膜作为高活性电催化剂,可在宽pH范围内从水中制氢

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The performance of electroless plated Ni-B-x films was studied in a wide pH range for the hydrogen evolution reaction (HER). The atomic ratio of B to Ni has great influence on the particle size and the morphology of Ni-B-x, materials, and more importantly on the catalytic H2 evolution property of Ni-B-x films. The film with a B:Ni atomic ratio of 0.54, denoted as Ni-B0.54, displayed the best performance with a current density of 10 mA cm(-2) at very low over potentials (eta) of 45 mV in 0.5 M H2SO4, 54 mV in 1.0 M pH 7 phosphate buffer solution (PBS), and 135 mV in 1.0 M KOH, and the catalytic activity maintained over 20-h electrolysis at 11=100 mV in all tested media of different pH values. The Tafel slopes of the Ni-B-0.54 film are 43, 77, and 88 mV dec(-1) in 0.5 M H2SO4; 1.0 M neutral PBS, and 1.0 M KOH, respectively. These results show that the combination of earth -abundant nickel and boron elements in an optimal B-to-Ni atomic ratio can provide highly active and stable electrocatalysts for the HER over a wide pH range. (C) 2015 Elsevier Ltd. All rights reserved.
机译:在较宽的pH范围内研究了化学镀Ni-B-x膜的性能,以进行析氢反应(HER)。 B与Ni的原子比对Ni-B-x,材料的粒径和形态具有很大的影响,更重要的是对Ni-B-x膜的催化H 2析出性能具有重要影响。 B:Ni原子比为0.54的薄膜表示为Ni-B0.54,在0.5 M的超低电势(eta)为45 mV时,电流密度为10 mA cm(-2)时表现出最佳性能H2SO4、1.0 m pH的7磷酸盐缓冲溶液(PBS)中的54 mV和1.0 M KOH的135 mV的催化活性在不同pH值的所有测试介质中均以11 = 100 mV在20小时的电解过程中保持。 Ni-B-0.54薄膜的Tafel斜率在0.5 M H2SO4中为43、77和88 mV dec(-1);分别为1.0 M中性PBS和1.0 M KOH。这些结果表明,在最佳的B-Ni原子比下,富含稀土元素的镍和硼元素的组合可以为HER在宽pH范围内提供高活性和稳定的电催化剂。 (C)2015 Elsevier Ltd.保留所有权利。

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