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'Force-Feedback' Leveling of Massively Parallel Arrays in Polymer Pen Lithography

机译:聚合物笔光刻中大规模平行阵列的“强制反馈”调平

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摘要

Polymer pen lithography is a recently developed molecular printing technique which can produce features with diameters ranging from 80 nm to > 10 mu m in a single writing step using massively parallel (> 10(7) pens) arrays of pyramidal, elastorneric pens. Leveling these pen arrays with respect to the surface to produce uniform features over large areas remains a considerable challenge. Here, we describe a new method for leveling the pen arrays chat utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004 degrees, thereby producing features that vary by only 50 nm over 1 cm.
机译:聚合物笔平版印刷术是一种最近开发的分子印刷技术,使用锥形,锥形弹性笔的大量平行(> 10(7)笔)阵列,可以在单个书写步骤中产生直径范围为80 nm至> 10μm的特征。相对于表面平整这些笔阵列以在大面积上产生均匀的特征仍然是相当大的挑战。在这里,我们描述了一种用于调平笔阵列的新方法,聊天利用笔阵列和表面之间的力实现小于0.004度倾斜的调平,从而产生的特征在1厘米范围内仅变化了50 nm。

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