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首页> 外文期刊>Molecular simulation >Problems, successes and challenges for the application of dispersion-corrected density-functional theory combined with dispersion-based implicit solvent models to large-scale hydrophobic self-assembly and polymorphism
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Problems, successes and challenges for the application of dispersion-corrected density-functional theory combined with dispersion-based implicit solvent models to large-scale hydrophobic self-assembly and polymorphism

机译:分散校正的密度泛函理论与基于分散的隐式溶剂模型相结合应用于大规模疏水自组装和多态性的问题,成功和挑战

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摘要

The recent advent of dispersion-corrected density-functional theory (DFT) methods allows for quantitative modelling of molecular self-assembly processes, and we consider what is required to develop applications to the formation of large self-assembled monolayers (SAMs) on hydrophobic surfaces from organic solution. Focus is on application of the D3 dispersion correction of Grimme combined with the solvent dispersion model of Floris, Tomasi and Pascual-Ahuir to simulate observed scanning-tunnelling microscopy (STM) images of various polymorphs of tetraalkylporphyrin SAMs on highly oriented pyrolytic graphite surfaces. The most significant problem is identified as the need to treat SAM structures that are incommensurate with those of the substrate, providing a challenge to the use of traditional periodic-imaging boundary techniques. Using nearby commensurate lattices introduces non-systematic errors into calculated lattice constants and free energies of SAM formation that are larger than experimental uncertainties and polymorph differences. Developing non-periodic methods for polymorph interface simulation also remains a challenge. Despite these problems, existing methods can be used to interpret STM images and SAM atomic structures, distinguishing between multiple feasible polymorph types. They also provide critical insight into the factors controlling polymorphism. All this stems from a delicate balance that the intermolecular D3 and solvent Floris, Tomasi and Pascual-Ahuir corrections provide. Combined optimised treatments should yield fully quantitative approaches in the future.
机译:色散校正的密度泛函理论(DFT)方法的最新出现允许对分子自组装过程进行定量建模,我们考虑了开发在疏水表面上形成大型自组装单层(SAMs)的应用所需的条件。来自有机溶液。重点是将Grimme的D3色散校正与Floris,Tomasi和Pascual-Ahuir的溶剂色散模型相结合的应用,以模拟在高度取向的热解石墨表面上四烷基卟啉SAM的各种多晶型物的观察到的扫描隧道显微镜(STM)图像。确定了最重要的问题是需要处理与基底不相称的SAM结构,这给使用传统的周期性成像边界技术带来了挑战。使用附近相称的晶格将非系统误差引入到计算出的晶格常数和SAM形成的自由能中,这些误差大于实验不确定性和多晶型差异。为多晶型物界面仿真开发非周期性方法也仍然是一个挑战。尽管存在这些问题,现有方法仍可用于解释STM图像和SAM原子结构,从而区分多种可行的多晶型物类型。他们还提供了对控制多态性因素的批判性见解。所有这些源于分子间D3和溶剂Floris,Tomasi和Pascual-Ahuir校正提供的微妙平衡。组合的优化治疗方法将在将来产生完全定量的方法。

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