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Electromagnetic interference (EMI) shielding efficiency (SE) characteristics of the ITO/Ag multilayer structure

机译:ITO / Ag多层结构的电磁干扰(EMI)屏蔽效率(SE)特性

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The electromagnetic interference (EMI) shielding efficiency (SE) of multilayered thin films in which indium-tin-oxide (ITO) and Ag were deposited alternately from 3 Layer to 9 Layer on Poly Methly Methacrylate (PMMA) substrates at the room temperature using a RF sputtering. We measured optical and electrical characteristics by UV-spectrometer and 4 point probe method. The measurement of EMI shielding efficiency (SE) in the frequency ranges from 50 MHz to 1.5 GHz was performed by using ASTM D 4935-89 method. We compared the measured EMI SEs with theoretical simulation data. Our EMI SE multi-layers showed relatively low resistivities and high transmittances. In this study, we obtain good optical and electrical characteristics with a minimum transmittance of about 60% at 550 nm wavelength and sheet resistance of 2 similar to 3 Omega/sq., respectively. Measured EMI SEs were over 50 dB and similar to theoretical simulation data.
机译:室温下使用聚甲基丙烯酸甲酯(PMMA)基板在3层到9层交替沉积氧化铟锡(ITO)和银的多层薄膜的电磁干扰(EMI)屏蔽效率(SE)。射频溅射。我们通过紫外光谱仪和四点探针法测量了光学和电气特性。使用ASTM D 4935-89方法对50 MHz至1.5 GHz频率范围内的EMI屏蔽效率(SE)进行了测量。我们将测得的EMI SE与理论仿真数据进行了比较。我们的EMI SE多层膜显示出较低的电阻率和较高的透射率。在这项研究中,我们获得了良好的光学和电气特性,在550 nm波长处的最小透射率约为60%,薄层电阻为2,分别类似于3 Omega / sq.。测得的EMI SE超过50 dB,与理论仿真数据相似。

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