MICROSTRUCTURES AND MAGNETIC PROPERTIES OF COBALT THIN FILMS

摘要

Cobalt thin films deposited by radio frequency sputtering were investigated. Microstructures of the Co films were analyzed by XRD and TEM. The results show that films microstructure varies wit h the variation of the sputter g as pressure P-Ar. Magnetic properties measured by VSM show that all the films possess relatively high saturation magnetization 4 pi M-s, and strong in-plane uniaxial magnetic anisotropy field H-k. Co films deposited below 0.3 Pa show soft magnetic properties and its microwave permeability was measured by vector network analyzer in the 0.1-5GHz range.