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首页> 外文期刊>Mineral Processing and Extractive Metallurgy Review >Magnetron Sputtered TiN Coatings Modified by Chromium, Nickel and Electroless Nickel (EN) Interlayers on Mild Steel
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Magnetron Sputtered TiN Coatings Modified by Chromium, Nickel and Electroless Nickel (EN) Interlayers on Mild Steel

机译:低碳钢上的铬,镍和化学镍(EN)中间层修饰的磁控溅射TiN涂层

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TiN films were deposited by reactive d.c. magnetron sputtering on mild steel substrate. Because of presence of inherent porosity and internal stresses, TiN coatings cannot be relied to give corrosion protection; also TiN coatings need a good load support. Electroplated chromium and nickel and electroless nickel (EN) were deposited by plating as interlayers below the TiN coatings to study comparatively the effect of these interlayers. Chromium was electrodeposited from conventional sulfate catalysed chromic acid bath and nickel using Watt's bath while EN by electroless deposition process using acidic hypophosphite bath. Three different thicknesses viz. 2, 4 and 10 mum of interlayers were employed to study their influence on TiN coatings. The corrosion behaviour of TiN coated mild steel samples with and without the interlayers was studied using potentiodynamic measurement technique in deaerated 1N H_2SO_4 electrolyte. It was observed that TiN coatings on mild steel without any interlayer almost mimic the behaviour of the substrate, while the presence of any of the three interlayers showed a considerable improvement in the corrosion resistance.Microhardness measurements have shown that the surface hardness values of TiN coatings on mild steel increased to 1907 HK_(25) from about 1000 HK_(25) when employed with chromium interlayer, and to 1484 HK_(25) with EN interlayer, while electroplated nickel as an interlayer increased the hardness to a lesser extent (1289 HK_(25)).X-ray diffraction analysis has shown that the phases present in the TiN coatings were mainly TiN (200) and TiN (111). Chromium coated samples were found to show the broadening of Fe (110) peak, which also corresponds to Cr (110) peak. Interlayer nickel showed the presence of mainly Ni (200) and Ni(111) phases while EN was amorphous in structure. The crystalline phases Ni_3P and Ni were evident when TiN top-coat was given by d.c. magnetron sputtering on EN plated mild steel samples.
机译:TiN膜通过反应性dc沉积。在低碳钢基底上进行磁控溅射。由于存在固有的孔隙率和内部应力,因此不能依靠TiN涂层来提供腐蚀保护。 TiN涂层也需要良好的负载支持。通过电镀在TiN涂层下面将电镀铬和镍以及化学镀镍(EN)作为中间层进行沉积,以比较研究这些中间层的效果。铬是使用Watt浴从常规硫酸盐催化的铬酸浴和镍中电解沉积的,而EN则是使用酸性亚磷酸盐浴通过化学沉积工艺进行电沉积的。三种不同的厚度。使用2、4和10微米的中间层来研究它们对TiN涂层的影响。利用势能测量技术研究了带和不带中间层的TiN涂层低碳钢样品在脱气的1N H_2SO_4电解质中的腐蚀行为。观察到,在无任何夹层的低碳钢上的TiN涂层几乎模仿了基材的行为,而这三个夹层中的任何一个的存在都表明了其耐腐蚀性的显着提高。显微硬度测量表明,TiN涂层的表面硬度值低碳钢的表面硬度从与铬夹层一起使用时的约1000 HK_(25)增至1907 HK_(25),而与EN夹层一起使用时增至1484 HK_(25),而电镀镍作为夹层则将硬度提高的程度较小(1289 HK_ (25))。X射线衍射分析表明,TiN涂层中存在的相主要是TiN(200)和TiN(111)。发现镀铬样品显示出Fe(110)峰的展宽,这也对应于Cr(110)峰。层间镍显示主要存在Ni(200)和Ni(111)相,而EN在结构上为非晶态。当用d.c给出TiN面涂层时,结晶相Ni_3P和Ni很明显。磁控溅射在镀EN的低碳钢样品上进行。

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