首页> 外文期刊>Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada >Characterization of tungsten surfaces by simultaneous work function and secondary electron emission measurements
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Characterization of tungsten surfaces by simultaneous work function and secondary electron emission measurements

机译:通过同时的功函数和二次电子发射测量来表征钨表面

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摘要

The changes of the work function (Phi) and the secondary electron emission (SEE) of oxygen covered polycrystalline tungsten occurring after ion sputtering and heat treatments have been investigated. The chemical composition was analyzed by X-ray photoelectron spectroscopy (XPS), and the electron emission properties by work function spectroscopy (WFS). We observed in what manner the chemical changes of the surface are reflected in the work function and SEE. The simultaneous change of Phi and SEE in the case of oxygen covered tungsten have been pointed out and a direct relationship between them can be supposed. [References: 23]
机译:研究了在离子溅射和热处理后,氧气覆盖的多晶钨的功函数(Phi)和二次电子发射(SEE)的变化。通过X射线光电子能谱(XPS)分析化学组成,并通过功函数光谱(WFS)分析电子发射性质。我们观察了表面的化学变化以何种方式反映在功函数和SEE中。有人指出,在氧气覆盖钨的情况下,Phi和SEE会同时变化,并且可以推测它们之间存在直接关系。 [参考:23]

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