Microfabrication and test of a magnetic field sensor using electrodeposited thin film of giant magnetoresistive (Cu/Co){sub}x multilayers

摘要

Giant magnetoresistive (GMR) films of (Cu/Co){sub}x multilayers have been successfully electrodeposited on a silicon substrate. An effort has also been made to microfabricate a sensor based on the electroplated GMR multilayers. Fabrication of the microsensor was implemented through computer-controlled electrodeposition of GMR thin films and lithographic patterning technology. The prototype microsensor shows a magnetoresistance ratio of △R/R = 4% in a 3000 Gauss magnetic field. It was also found that the sensitivity of the prototype sensor is significantly affected at low fields by the patterning process.