Modified photo-sensors for grating-image type micro-encoder

摘要

New integration technique for grating-imag-ing-type encoder is proposed and the sensor for the encoder has been fabricated using Si micromachining technology. The sensor consists of the Si grids and line photodiodes. The light emission through the Si grids and the light detection with the four-phase-shifted line photodiodes make the optical system compact. Moreover, another photodiode array of the M-series arrangement is installed on the same substrate for the zero-point detection.