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首页> 外文期刊>Micron: The international research and review journal for microscopy >Study of vertical Si/SiO_2 interface using laser-assisted atom probe tomography and transmission electron microscopy
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Study of vertical Si/SiO_2 interface using laser-assisted atom probe tomography and transmission electron microscopy

机译:激光辅助原子探针层析成像和透射电子显微镜研究垂直Si / SiO_2界面

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摘要

Laser-assisted atom probe tomography has opened the way to three-dimensional visualization of nanostructures. However, many questions related to the laser-matter interaction remain unresolved. We demonstrate that the interface reaction can be activated by laser-assisted field evaporation and affects the quantification of the interfacial composition. At a vertical interface between Si and SiO_2, a SiO_2 molecule tends to combine with a Si atom and evaporate as a SiO molecule, reducing the evaporation field. The features of the reaction depend on the direction of the laser illumination and the inner structure of tip. A high concentration of SiO is observed at a vertical interface between Si and SiO_2 when the Si column is positioned at the center of the tip, whereas no significant SiO is detected when the SiO_2 layer is at the center. The difference in the interfacial compositions of two samples was due to preferential evaporation of the Si layer. This was explained using transmission electron microscopy observations before and after atom probe experiments.
机译:激光辅助原子探针层析成像技术为纳米结构的三维可视化开辟了道路。然而,与激光物质相互作用有关的许多问题仍未解决。我们证明界面反应可以被激光辅助的场蒸发激活并影响界面组成的定量。在Si和SiO_2之间的垂直界面处,SiO_2分子倾向于与Si原子结合并作为SiO分子蒸发,从而减小了蒸发场。反应的特征取决于激光照射的方向和尖端的内部结构。当Si柱位于尖端的中心时,在Si和SiO_2之间的垂直界面处观察到高浓度的SiO,而当SiO_2层位于中心时,没有检测到明显的SiO。两个样品的界面组成的差异是由于Si层优先蒸发所致。使用原子探针实验之前和之后的透射电子显微镜观察可以解释这一点。

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